APA:
Benyahia, Kaddour, Benamara, Ouarda, Benhaya, Abdelhamid, Guidoum, Arsalane Chouaib (2026). Deposition angle as a continuous parameter: automated glad growth and structure–property correlations in silicon thin films.
Materiali in tehnologije, letnik 60, številka 4, str. 635–644.
URN:NBN:SI:DOC-U51ZZSTB from http://www.dlib.si
MLA:
Benyahia, Kaddour, Benamara, Ouarda, Benhaya, Abdelhamid, Guidoum, Arsalane Chouaib. "Deposition angle as a continuous parameter: automated glad growth and structure–property correlations in silicon thin films."
Materiali in tehnologije letnik 60. številka 4 (2026) str. 635–644.
<http://www.dlib.si/?URN=URN:NBN:SI:DOC-U51ZZSTB>