APA:
Kuang, Xuping, Tian, Jili, Guo, Hui, Hou, Yi, Zhang, Huayu, Liu, Tiejun (2018). Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing.
Materiali in tehnologije, letnik 52, številka 2, str. 119-123.
URN:NBN:SI:DOC-T2RZTAW0 from http://www.dlib.si
MLA:
Kuang, Xuping, Tian, Jili, Guo, Hui, Hou, Yi, Zhang, Huayu, Liu, Tiejun. "Feasible method to fabricate a nickel-nanodot mask on a silicon substrate with conventional thermal annealing."
Materiali in tehnologije letnik 52. številka 2 (2018) str. 119-123.
<http://www.dlib.si/?URN=URN:NBN:SI:DOC-T2RZTAW0>