The article reviews the history of ion implantation. It concentrates on the time period from the invention of the ion implantation in 1905 until about 1978, when ion implaters have come of age. In the first part we describe the invention of ion implantation and development until World War II. In the second part of the article we review the development of the use of ion implantation for transistor industry after the World War II. We present the use of ion implantation in semiconductor devides. Special concern is put on the use of the ion implantation in metallury of recent times. Some details about echo of research of ion implantation among Slovenes are also described.

Rights

URN

URN:NBN:SI:DOC-06MKQDK9

COBISSID

15669031

Added

16.09.2009

Metadata

Citation

APA:

Južnič, Stanislav (2000). Zgodovina ionske implantacije. Vakuumist, volume 20, issue 3/4, str. 15-33. URN:NBN:SI:DOC-06MKQDK9 from http://www.dlib.si

MLA:

Južnič, Stanislav. "Zgodovina ionske implantacije." Vakuumist volume 20. issue 3/4 (2000) str. 15-33.
<http://www.dlib.si/?URN=URN:NBN:SI:DOC-06MKQDK9>

Vakuumist
1981-
(Assembly record)