SILICON PHOTOMULTIPLIER: A NOVEL TYPE OF PHOTO-DETECTOR WITH SINGLE PHOTON DETECTION CAPABILITY Giorgio Umberto Pignatel Dept. of Electronic and information Engineering DIEI, Perugia, Italy Key words: silicon photomultiplier, single photon, avalanche breakdown, Geiger mode, photodetector Abstract: Silicon Photo-Multiplier (SiPM) is a novel type of avalanche photon detector which operates In Geiger mode. It allows great advancement in photon detection and is a good candidate for replacing traditional photomultiplier tubes (PMTs). In this paper the current status of development of a research project founded by the Italian National Institute for Nuclear Physics (INFN) will be presented, in the framework of the DASIPM collaboration which involves several Universities and the Center for Scientific and Technological Research (FBKirst, Trento, Italy). Recent advancements in SIPM technology will be presented, along with some preliminary results and a discussion about possible exploitations in medical and astroparticle physics applications. Silicijeva fotopomnoževalka: nov tip fotodetektorja s sposobnostjo detekcije posameznega fotona Kjučne besede: silicijeva fotopomnoževalka, posamezni foton, plazoviti preboj, Geigerjev način, fotodetektor Izvleček: Silicijeva fotopomnoževalka (SiPM) je nov tip plazovitega prebojnega fotodetektorja, ki deluje v Geigerjevem načinu. Nova fotopomnoževalka predstavlja velik napredek pri detekcijl fotona in je dober kandidat za nadomestitev tradicionalne fotomultlplikacijske cevi (PMT). V prispevku bo predstavljen trenutni položaj na projektu, ki je podprt od Italijanskega nacionalnega instituta za nuklearno fiziko (INFN) v okviru sodelovanja DASIPM, ki vključuje nekatere univerze ter Center za znanstvene in tehnološke raziskave (FBKirst, Trento, Italy). Predstavljeni bodo novi dosežki na področju SIPM tehnologije, skupaj z nekaterimi preliminarnimi rezultati ter obravnavo možnih aplikacij v medicini in astrofiziki. 1 Introduction Efficient detectors for iow-light level (LLL) and photon counting applications are today required in a large variety of fields including astroparticle physics, nuclear medicine and high-energy physics. For such experiments, photon detectors typically employed are vacuum photon detectors, i.e., photomultiplier tubes—PMT, micro-channel plate photo-multipliers-MCP, hybrid photodetectors-HPD/1-3/. The main advantages of such devices are high internal gain (10®-10^), very good timing resolution (tens or hundreds of ps) and good single photoelectron resolution. However, these devices have low quantum efficiency limited by the photo-cathode materials, high operation voltages, they are sensitive to magnetic fields and the vacuum technology used for their fabrication confers them a bulky shape and sensitivity to handling. The search for new photon detectors which can over-come the drawbacks of vacuum photon detectors has lead to the development of solid state photon detectors (PN or PIN photodiodes, avalanche photodiodes-APD and avalanche photodiodes operating in linear Geiger-mode— GAPD or SPAD) /4, 5/. These solid-state devices have important advantages overthe vacuum ones, namely higher quantum efficiency, lower operation voltages, insensi-tivity to the magnetic fields and robustness and compactness. The step-by-step evolution of solid-state photon detectors was mainly determined by their internal gain: a PIN has no gain, an APD has a gain of few hundreds and the GAPD gain is 10^-10®. A gain comparable with that of the vacuum photon detectors allowed the GAPD to achieve single-photon sensitivity and to be used in LLL applications (-10^ photons/mm^/sec). Essentially, a GAPD is a p-n junction that operates above the breakdown voltage. At this bias, the electric field is so high that a single charge carrier injected into the depletion layer can trigger a selfsustaining avalanche (so-called Geiger breakdown). The Geiger breakdown mechanism in avalanche diodes was studied several years ago /6, 7/ and important progresses on suitable quenching circuits al. /8/. However, a GAPD has the disadvantage that it acts as a binary device, having a standardized output signal independent of the number of incident photons. A new structure called Silicon Photo- /9-10/ overcome this inherent limitation bringing together on the same substrate many micro-cells connected in parallel, in which each micro-cell is a GAPD in series with its integrated quenching resistor. Therefore, the SiPM acts as an analog device with an output signal representing the sum of the signals from all fired micro-cells and it becomes a suitable solid-state device for LLL detection and photon counting applications, including the detection of the space radiation in astroparticle physics, medical imaging in nuclear medicine, and calor-imetryin high-energy physics/11, 12/. At the beginning of 2005, within collaboration between the Italian National Institute for Nuclear Physics (INFN) and the Center for Scientific and Technological Research of Trento, Italy (FBK-irst), a 3-year project aimed at the development of silicon photomultipliers was launched. Within this project, the role of FBK-irst was the technological development and the electrical characterization of silicon photomultipliers, whereas the role of INFN was mainly focused on the application of such devices, with special emphasis on Calorimetry, time-of-flight (TOP) measurements, and PositronEmission Tomography (PET). In this paperthe FBK-irst activity in developingand producing SiPMs will be reviewed, and theongoing activity of the DASIPM collaboration /13/:"Development and Applications of Silicon Photo-Multipliers" - which involves the Universities ofPisa, Perugia, Trento, Bologna and Bari - will bereported. 2 Detector description Fig.1 shows the picture of a SiPM device. It is composed by a matrix of 25x25 photo-diode cells with an area of 40x40 covering a surface of 1x1 mm^. The device is realized on a low-resistivityp+-type substrate (500jj,m thick). Fig. 2: Schematic of a single GAPD cell. Fig. 1: Photograph of the first prototype of SIPMfrom FBK-irst. The structure of each diode consists of an asymmetric shallow junction (n+p) implanted in a thin (~4|j,m) lowly doped p-type epitaxial layer. The junction is created by an Arsenic implantation and is located at about lOOnm from the top silicon surface.The breakdown voltage value is fixed by a further Boron implantation. The doping profiles and the dielectric layers deposited on the silicon surface are designed to enhance the photon-detection efficiency in the short wavelength region (420-450nm) /14/. It must be emphasized that each micro-pixel has about 6Pm wide dead area along the edges which is needed to accommodate the structures for the reduction of the lateral fields (guard rings) and for the electrooptical isolation (V-groove, fig.2). A simple equivalent circuit of the SiPM is shownin fig.3. A reverse bias voltage (Vbias) is applied to all junctions through the common substrate electrode to deplete the epi-layer and the induced current is read on the resistor side electrode. Fig. 3: Simplified equivalent circuit of a SIPM. 2.1 Principle of operation When the diodes are biased (VB) at few volts above breakdown (VBD) the electric field in the junction region is so high that any carrier, generated either thermally or by photons and drifted in that region, may trigger a self-sustaining avalanche breakdown. While a swift current pulse grows to a macroscopic level in avery short time (~500ps) it flows through a series resistor RQ which limits the current to about 10|^A and develops a voltage drop which quenches the avalanche by reducing the bias voltage. Thereafter the original over-voltage (AV=Vb-Vdb) isexponentially recovered within a time constant RqxCd. At room temperature the rate of thermally generated carriers is of the order of 0.1-1.0MHz/mm2 (dark-count rate) and that represents the limitin gfactor (noise level) of the device. 3 Detector characterization This section reports the characterization of the single micro-pixel. It is divided in two parts describing the static and the dynamic functional characteristics, respectively. 3.1 Static Characterization Several information concerning the behavior of the SiPM can be inferred from static l-V measurements 3.1.1 Forward characteristic The forward l-V characteristic of a single micro-cellor a whole SiPM allows us to extract the value of the quenching resistor RQ. Fig. 5. Reverse l-V characteristics of 9 SiPM tal 3 or 4. 4 SiPM parameters The performance of a Silicon Photomultiplier is affected by two important parameters: photon detection efficiency (PDE) and Linearity (dynamic range). Pa = Pe + Ph- PePh where Pe and Ph are the electron and hole avalanche initiation probabilities respectively/19, 20/. These terms depend on the impact ionization coefficients of electrons (a) and holes (ß) which are strongly dependent upon the electric field (applied bias voltage). The ionization coefficient for electrons is higherthan that for holes (e.g., at 5x10®V/ cm, a is about twice than ß) Fig. 12. SiPM dark count rate as a function of puis eamplitude (tinreshold) for different bias voltages. i.n- 4.1 Photon detection efficiency - PDE PDE can be defined as the probability that an incident photon generates a useful output signal. The detection efficiency of a SiPM is given by the product of 3 terms: the quantum efficiency (QE), the probability to initiate an avalanche breakdown (Pa),and the geometrical - or fill - factor (GF). PDE = QEfX) X Pa(V) x GF 4.1.1 Quantum efficiency - QE(A) The quantum efficiency represents the probability for a photon to generate an e-h pair. It is given by the product of 2 factors: the transmittance of the dielectric layer on top of the silicon surface and the intrinsic silicon QE. Both are wavelength dependent. The former can be maximized by implementing an anti-reflective coating (ARC). The second represents the probability for a photon that has crossed the dielectric layer to generate an e-h pair in the active area of the device. In a conventional n+/p/p+ diode, the active layer is roughly limited on top by the undepleted n+ doped layer, whereas on the bottom it is limited by the p+ layer used for the ohmic contactor by the highly doped substrate in case of epitaxial substrates. Indeed, when a pair is generated in those regions, there is a high probability for electrons andholes to recombine by means of Auger or Shockley-Read-Hall (SRH) processes. For short wavelengths, the problem is focused in the top layer. As an example, a 420nm light is almost totally absorbed in the first 500nm of silicon, which, for non-optimized fabrication processes, is usually well inside the undepleted layer. 4.1.2 Avalanche probability - Pa(V) There is a finite probability that a carrier swept or generated within the space-charge region triggers an avalanche breakdown. In case of a photon generated event, 2 carriers are created travelling in opposite directions. Both contribute to the triggering probability as: Fig. 13. Ionization rates of electrons and holes in silicon /Grant SSE 16, 1973/. 4.1.3 Geometric factor - GF The ratio between the active area and the total area of the device is a critical issue in SiPMs. The reason is that each GAPD cell is surrounded by a dead region determined by the guard ring and the structure preventing optical crosstalk. Considering that the area of a cell can be very small (of the order of 30x30|j,m^) even few microns of dead region around the cell have a detrimental effect on the geometrical efficiency. Presently, the fill factor of FBK-irst SiPM is limited to 0.2-0.33 for cell areas ranging from 30x30jim^ to 50x50|im2. As an example, the PDE of a SiPM with reported in fig.13 /21/. factor=0.2 is The PDE dependence on the bias voltage has to be attributed to the avalanche initiation probability. The dependence on the light wavelength is a mixed contribution from Pa and QE. To separate the two contributions the quantum efficiency of some diodes extracted from the same wafers, which have the same anti-reflecting coating and doping profiles have been measured (see fig.15 from ret /21/). It is worth while noting that in a conventional n+/p/p+ device structure, there is more chance that the avalanche breakdown is initiated by electrons at long wavelength, and by holes at short wavelength, as the photon absorption length in silicon ranges from 0.01 fim to few |j,m for wavelengths 300nm 35-34 -33-32 ^ Mesisurements Linear Fil: 70.2 mV/K 29-j j ' 220 240 260 280 300 320 Temperature (K) Fig. 19. SiPM breal26000ph/MeV), short decay time (~40ns), and a max emission wavelength of 420nm (blue). In positron emission tomography the position of the emitting radioactive source is reconstructed from the coincidence of two 0.511 MeV gamma photons which are emitted at 180° by positron annihilation. A spatial resolution of less than 1mm over a distance of several cm can be achieved, provided that the 511KeV spectrum peak can be separated from the low energy tail that is generated by Comptons cattering of gamma photons in living tissue. Another difficulty is that, while keeping a submillimeter-space resolution, we would like image are latively large area of the body tissue. Finally, the large number of photons emitted by the scintillator can saturate the detector. The solution is a large area detector, or a matrix of many pixilated detectors. Fig.22 shows a SiPM matrix composed of four (2x2) pixel elements in a common substrate, with a 1 mm^ LYSO sein- 1 m Fig. 23. SiPM matrix of 2x2 pixels with at 1 x 1 x lOmm^ LSO cubic scintillator placed in the middle .P:il , /ndf_6i.«1-1/53 I C f ! 1 !t .Jirl ? 1 i ^ 1 f.leiHi 114 U<)l i Sigma n/^ >}') 0 -Jxm 400{r SSoi).....soöo'ior 10 U yl I'-'I'jO riiOWmOOO20500 QOC channel Fig. 24. ^^Na energy spectrum obtained as the sum of four adjacent SiPI\/l. The energy resolution is only 30% FWHM, but the sodium peak is well defined and can easily separated from the Compton tail by setting the threshold of the discriminator above 7000 channels. A much better resolution of 16% FWHM has been obtained on a 3x3mm^ SiPM (3200 sub-pixels) coupled to a cubic 3x3x3mm^ LYSO crystal /33/. The results obtained so far are very promising, and support the idea that large area detectors can be fabricated to meet the specifications of PET/MRI. 6.2 Timing resolution The SiPM is a fast detector, and this characteristic can be exploited in TOP or TOF-PET experiments. 6.2.1 Single photon timing resolution The intrinsic timing resolution of a SiPM has been evaluated at the single photoelectron (p.e.) level, illuminating the device with a pulsed laser with 60 fs pulse width at 80 MHz rate (T=12.34 ns) with less than 100 ps jitter /31/. The time difference between contiguous signals is evaluated and plotted, and there suiting distribution is fitted with a Gaussian function (fig.25, ref/34/). Fig. 26. Timing resolution of a SiPI\/l as a function of photogenerated electrons (Npe) ployed to estimate the time jitter between the two devices. The time distribution obtained for two LSO crystals coupled to two SiPMs is shown in fig.26. ; Til I 1 1 'I 1 M „ -.n if I I "T " 1 1 117 < ■ i.r 10 ' fill If III , Fig. 25. Timing resolution of a SiPM at single photoelectron level as a function of the overvoltage measured at two different wavelengths The measurement has been performed with blue light (400+7nm) and red light (800±15nm). An intrinsic timing resolution of ~ 60 ps rms has been measured for blue light at 4V overvoltage. The value for red light is higher, since the photons penetrate deeper in the detector and the carriers drift for a longer time before reaching the avalanche region. 6.2.2 Multi photon timing resolution When more than 1 p.e. is generated in the SiPM, the timing resolution improves as 1/VNpe, according to the Poisson statistics. At 15p.e, the timing resolution is ~ 20 ps rms. 6.2.3 Coincidence timing resolution The time coincidence of events occurring in two different detectors is measured with two discriminators. One select the full energy event and generates the trigger signal; the second generates the coincidence signal that will be em- Fig. 27. Coincidence timing resolution of two SiPfVis coupled to LSO crystals. The timing resolution is 600ps sigma (1.4nsFWHM); aval-ue well below the typical 10ns resolving time used in PET. Finally, fig.26 shows the 511 KeV Na spectrum obtained with a 1mm x 1mm x 10mm LSO crystal coupled to a SiPM, operated in coincidence with another device. In these conditions an energy resolution of 21 % FWHM was obtained / 33/. 7 Conclusions Silicon photomultipliers (SiPMs) have undergone a fast development in the last few years and they are currently produced by different manufacturers (Amplification Technologies, id-Quantique, Hamamatsu, Photonique, SensL, Zecotek). Their numerous advantages as compared to other photo detectors, i.e.,high gain, fast timing, compactness, insensitivity to magnetic fields, make them excellent candidates for replacing PMTs and APDs in several applications, in particular for nuclear medicine/11/. In the last year, SiPMs have further improved their characteristics, mainly increasing the photon detection efficiency (PDE) in .if'W ISüfu " ill 151 . 1fr-I it 1 >1 |[)t' III - j I ■ >0 tfifiO gMR if ' i "'"u! 'fli .nr I „ I, Fig. 28. ^^Na (E=511KeV) coincidence spectrumobtained from two SiPM in opposition the blue region, enlarging the size of the active area and reducing the noise /35/, In the future the technology development will be devoted to the realization of low noise, large area, pixilated detectors /36/. However, it should be emphasized that the exploitation of these detectors will not be possible without a contemporary development of dedicated read-out ASIC chips. 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Petasecca et al,, "Gamma spectroscopyperformance of silicon photomultipliers coupledwith LYSO scintillators", 2008 IEEE Nucl, Sei,Symposium, Dresden GE, 19-25 Oct, 2008 /34/ G, Llosa et al,, "Novel silicon photomultipliersfor PET applications", lEEETrans, Nuol, Sei,,vol,55, pp, 877-881, 2008 /35/ C. Piemonte et al., "Recent developments onsilicon photomulti-pliers produced at FBK-irst ",2007 IEEE Nucl. Sei. Symposium ConferenceRecord N41-2, pp. 2089-2092, 2007 /36/ N. Dinu et al., "Characterization of a prototypematrix of Silicon PhotoMultipliers (SiPM's)", Stiiint'l Conference on New Developments inPtiotodetection, Aix-Les-Bains (France), June 15-20, 2008. http.7/ndip.in2p3.fr/ndip08/ Giorgio Umberto Pignatel on behaif of tiie iNFN-DASiPM collaboration Dept. of Electronic and Information Engineering DIEI - via G.Duranti 93, 06125 Perugia, Italy giorgio.pignatei@diei.unipg.it Prispelo (Arrived): 17.09.2008 Sprejeto (Accepted): 15.12.2008