<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-Z3RU21AE</identifier><date>2003</date><creator>Osredkar, Radko</creator><relation>documents/doc/Z/URN_NBN_SI_doc-Z3RU21AE_001.pdf</relation><relation>documents/doc/Z/URN_NBN_SI_doc-Z3RU21AE_001.txt</relation><format format_type="issue">2</format><format format_type="volume">33</format><format format_type="type">article</format><format format_type="extent">str. 79-85</format><identifier identifier_type="ISSN">0352-9045</identifier><identifier identifier_type="COBISSID">4307796</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-Z3RU21AE</identifier><language>slv</language><publisher>Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale</publisher><source>Informacije MIDEM</source><rights>InC</rights><subject language_type_id="slv">fotolitografija</subject><subject language_type_id="slv">Fourierova transformacija</subject><subject language_type_id="slv">optika</subject><subject language_type_id="slv">preslikave</subject><subject language_type_id="slv">uklon</subject><subject language_type_id="slv">valovanje</subject><title>Basics of optical imaging theory applied to the photolithographis process simulation</title><title>Osnove teorije optičnih preslikav, prirejene za potrebe simulacij fotolitografskega procesa</title></Record>