AES characterization of protective thin layers on the AgNiO.15 contact material after its treatment in the RF plasma

URN:NBN:SI:doc-UCFO7LUY1999Bizjak, MartinKoller, Lidijadocuments/doc/U/URN_NBN_SI_doc-UCFO7LUY_001.pdfdocuments/doc/U/URN_NBN_SI_doc-UCFO7LUY_001.txt229articlestr. 68-700352-904521124869URN:NBN:SI:doc-UCFO7LUYengStrokovno društvo za mikroelektroniko, elektronske sestavne dele in materialeInformacije MIDEMInCelektrični kontaktinikeljpasivacijaspektroskopijasrebroAES characterization of protective thin layers on the AgNiO.15 contact material after its treatment in the RF plasmaAES karakterizacija nanosov tankih zaščitnih plasti na AgNi0.15 kontaktnem materialu po obdelavi v RF plazmi