<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-RVWAIDKE</identifier><date>2004</date><creator>Belavič, Darko</creator><creator>Benčan, Andreja</creator><creator>Bernard, Janez</creator><creator>Cilenšek, Jena</creator><creator>Holc, Janez</creator><creator>Hrovat, Marko</creator><relation>documents/doc/R/URN_NBN_SI_doc-RVWAIDKE_001.pdf</relation><relation>documents/doc/R/URN_NBN_SI_doc-RVWAIDKE_001.txt</relation><format format_type="issue">3</format><format format_type="volume">34</format><format format_type="type">article</format><format format_type="extent">str. 7-10</format><identifier identifier_type="ISSN">0352-9045</identifier><identifier identifier_type="COBISSID">18356007</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-RVWAIDKE</identifier><language>eng</language><publisher>Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale</publisher><source>Informacije MIDEM</source><rights>InC</rights><subject language_type_id="slv">debeloplastni upori</subject><subject language_type_id="slv">fazni diagrami</subject><subject language_type_id="slv">rutenati</subject><subject language_type_id="slv">rutenijev oksid</subject><title>The interacions! of conductive and glass phase in thick-film resistors during firing</title></Record>