<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-RCBFIILG</identifier><date>2004</date><creator>Mihailović, Dragan</creator><creator>Uplaznik, Marko</creator><relation>documents/znanstveni_clanki/vakuumist/html/urn_nbn_si_doc-rcbfiilg.html</relation><relation>documents/znanstveni_clanki/vakuumist/pdf/urn_nbn_si_doc-rcbfiilg.pdf</relation><relation>documents/znanstveni_clanki/vakuumist/txt/urn_nbn_si_doc-rcbfiilg.txt</relation><format format_type="issue">1/2</format><format format_type="volume">24</format><format format_type="main">6 strani</format><format format_type="type">article</format><format format_type="extent">str. 13-18</format><identifier identifier_type="ISSN">0351-9716</identifier><identifier identifier_type="COBISSID">18438439</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-RCBFIILG</identifier><language>slv</language><publisher>Društvo za vakuumsko tehniko Slovenije</publisher><source>Vakuumist</source><rights>InC</rights><subject language_type_id="slv">fotolitografija</subject><subject language_type_id="slv">nanolitografija</subject><title>Basics of electron nanolithography</title><title>Osnove elektronske nanolitografije</title></Record>