<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-NGL1NJ87</identifier><date>1996</date><creator>Cvikl, Bruno</creator><relation>documents/doc/N/URN_NBN_SI_doc-NGL1NJ87_001.pdf</relation><relation>documents/doc/N/URN_NBN_SI_doc-NGL1NJ87_001.txt</relation><format format_type="issue">2</format><format format_type="volume">26</format><format format_type="type">article</format><format format_type="extent">str. 97-106</format><identifier identifier_type="ISSN">0352-9045</identifier><identifier identifier_type="COBISSID">2219030</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-NGL1NJ87</identifier><language>eng</language><publisher>Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale</publisher><source>Informacije MIDEM</source><rights>InC</rights><subject language_type_id="slv">diode</subject><subject language_type_id="slv">modeli</subject><subject language_type_id="slv">polprevodniki</subject><subject language_type_id="slv">upori</subject><title>O nizkofrekvenčni C-U odvisnosti Ag/n-Si(111) Schottky-jevih diod, nanešenih po metodi curka ioniziranih skupkov, CIS</title><title>On low frequency C-U relationship of the ionized cluster beam, ICB, deposited Ag/n-Si(111) Schottky diodes</title></Record>