<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-I1S2OKWQ</identifier><date>2014</date><creator>Jakša, Gregor</creator><creator>Kovač, Janez</creator><creator>Štefane, Bogdan</creator><relation>documents/doc/I/URN_NBN_SI_doc-I1S2OKWQ_001.pdf</relation><relation>documents/doc/I/URN_NBN_SI_doc-I1S2OKWQ_001.txt</relation><format format_type="issue">2</format><format format_type="volume">34</format><format format_type="type">article</format><format format_type="extent">str. 4-8</format><identifier identifier_type="ISSN">0351-9716</identifier><identifier identifier_type="COBISSID">28279335</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-I1S2OKWQ</identifier><language>slv</language><publisher>Društvo za vakuumsko tehniko Slovenije</publisher><source>Vakuumist</source><rights>InC</rights><subject language_type_id="slv">aminosilani</subject><subject language_type_id="slv">nanosi</subject><subject language_type_id="slv">površine</subject><subject language_type_id="slv">površinska obdelava</subject><subject language_type_id="slv">silicij</subject><subject language_type_id="slv">silicijeve površine</subject><title>XPS- in AFM-preiskava silicijevih površin, modificiranih z različnimi aminosilani</title></Record>