<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-GKVJSX8R</identifier><date>2015</date><creator>Singh, Avtar</creator><relation>documents/doc/G/URN_NBN_SI_doc-GKVJSX8R_001.pdf</relation><relation>documents/doc/G/URN_NBN_SI_doc-GKVJSX8R_001.txt</relation><format format_type="issue">1</format><format format_type="volume">45</format><format format_type="type">article</format><format format_type="extent">str. 73-79</format><identifier identifier_type="ISSN">0352-9045</identifier><identifier identifier_type="COBISSID">280572416</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-GKVJSX8R</identifier><language>eng</language><publisher>Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale</publisher><source>Informacije MIDEM</source><rights>InC</rights><subject language_type_id="slv">masni sloj</subject><subject language_type_id="slv">mikroelektronika</subject><subject language_type_id="slv">MOSFED</subject><subject language_type_id="slv">tranzistorji</subject><title>Comparative assesment of ground plane and strained based FDSOI MOSFET</title><title>Primerjalna ocena FDSOI MOSFET-ov z masnim slojem in na osnovi napetega silicija</title></Record>