{"?xml":{"@version":"1.0"},"edm:RDF":{"@xmlns:dc":"http://purl.org/dc/elements/1.1/","@xmlns:edm":"http://www.europeana.eu/schemas/edm/","@xmlns:wgs84_pos":"http://www.w3.org/2003/01/geo/wgs84_pos","@xmlns:foaf":"http://xmlns.com/foaf/0.1/","@xmlns:rdaGr2":"http://rdvocab.info/ElementsGr2","@xmlns:oai":"http://www.openarchives.org/OAI/2.0/","@xmlns:owl":"http://www.w3.org/2002/07/owl#","@xmlns:rdf":"http://www.w3.org/1999/02/22-rdf-syntax-ns#","@xmlns:ore":"http://www.openarchives.org/ore/terms/","@xmlns:skos":"http://www.w3.org/2004/02/skos/core#","@xmlns:dcterms":"http://purl.org/dc/terms/","edm:WebResource":[{"@rdf:about":"http://www.dlib.si/stream/URN:NBN:SI:doc-CSMMK5TL/8a335bf5-20b0-468f-a4d8-148cee5a082e/PDF","dcterms:extent":"659 KB"},{"@rdf:about":"http://www.dlib.si/stream/URN:NBN:SI:doc-CSMMK5TL/9761f631-4f97-481d-b275-cdee42b1a1ab/TEXT","dcterms:extent":"28 KB"}],"edm:TimeSpan":{"@rdf:about":"1985-2025","edm:begin":{"@xml:lang":"en","#text":"1985"},"edm:end":{"@xml:lang":"en","#text":"2025"}},"edm:ProvidedCHO":{"@rdf:about":"URN:NBN:SI:doc-CSMMK5TL","dcterms:isPartOf":[{"@rdf:resource":"https://www.dlib.si/details/URN:NBN:SI:spr-Z2J12Z6C"},{"@xml:lang":"sl","#text":"Informacije MIDEM"}],"dcterms:issued":"1999","dc:creator":["Gawlik, Grzegorz","Jagielski, Jacek","Mozetič, Miran","Zalar, Anton"],"dc:format":[{"@xml:lang":"sl","#text":"številka:2"},{"@xml:lang":"sl","#text":"letnik:29"},{"@xml:lang":"sl","#text":"str. 61-67"}],"dc:identifier":["ISSN:0352-9045","COBISSID:38370","URN:URN:NBN:SI:doc-CSMMK5TL"],"dc:language":"en","dc:publisher":{"@xml:lang":"sl","#text":"Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale"},"dc:subject":[{"@xml:lang":"sl","#text":"dopiranje"},{"@xml:lang":"sl","#text":"implantacija"},{"@xml:lang":"sl","#text":"ioni"},{"@xml:lang":"sl","#text":"površine"},{"@xml:lang":"sl","#text":"tanke plasti"}],"dcterms:temporal":{"@rdf:resource":"1985-2025"},"dc:title":{"@xml:lang":"sl","#text":"Ion implantation; a modern tool of surface engineering| Ionska implantacija, sodobna metoda za obdelavo površin|"},"dc:description":[{"@xml:lang":"sl","#text":"Ion implantation is a doping technique which uses energetic ion beams as vector of mass transport. The atoms to be implanted (often called impurity atoms) are thus ionized, accelerated, selected and directed towards the target. Due to the high kinetic energy (typically tens to hundreds of keV) the accelerated ions penetrate the target up to the depths from tens to thousands of nanometers. This method allows one to dope virtually all solids with any kind of atoms with high uniformity and up to very high concentrations. The basic principles, advantages and drawbacks as well as possible fields of application of ion implantation technique are briefly presented"},{"@xml:lang":"sl","#text":"Ionska implantacija je tehnika dopiranja, ki za prenos mase uporablja curke energetskih ionov. Atome, ki jih želimo implantirati, najprej ioniziramo, pospešimo, preberemo in usmerimo proti tarči. Zaradi njihove visoke energije (značilno desetine ali stotine keV) ioni prodrejo v tarčo do globine od nekaj deset do nekaj tisoč nanometrov. Metoda omogoča dopiranje praktično katerekoli trdne snovi s katerimikoli atomi do zelo visoke vsebnosti. Temeljne zakonitosti, prednosti in pomanjkljivosti, pa tudi možna področja uporabe te tehnike na kratko opisujemo v tem članku"}],"edm:type":"TEXT","dc:type":[{"@xml:lang":"sl","#text":"znanstveno časopisje"},{"@xml:lang":"en","#text":"journals"},{"@rdf:resource":"http://www.wikidata.org/entity/Q361785"}]},"ore:Aggregation":{"@rdf:about":"http://www.dlib.si/?URN=URN:NBN:SI:doc-CSMMK5TL","edm:aggregatedCHO":{"@rdf:resource":"URN:NBN:SI:doc-CSMMK5TL"},"edm:isShownBy":{"@rdf:resource":"http://www.dlib.si/stream/URN:NBN:SI:doc-CSMMK5TL/8a335bf5-20b0-468f-a4d8-148cee5a082e/PDF"},"edm:rights":{"@rdf:resource":"http://rightsstatements.org/vocab/InC/1.0/"},"edm:provider":"Slovenian National E-content Aggregator","edm:intermediateProvider":{"@xml:lang":"en","#text":"National and University Library of Slovenia"},"edm:dataProvider":{"@xml:lang":"sl","#text":"Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale"},"edm:object":{"@rdf:resource":"http://www.dlib.si/streamdb/URN:NBN:SI:doc-CSMMK5TL/maxi/edm"},"edm:isShownAt":{"@rdf:resource":"http://www.dlib.si/details/URN:NBN:SI:doc-CSMMK5TL"}}}}