<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-6RMO986Z</identifier><date>2005</date><creator>Cvelbar, Uroš</creator><creator>Drenik, Aleksander</creator><creator>Mozetič, Miran</creator><creator>Vesel, Alenka</creator><relation>documents/doc/6/URN_NBN_SI_doc-6RMO986Z_001.pdf</relation><relation>documents/doc/6/URN_NBN_SI_doc-6RMO986Z_001.txt</relation><format format_type="issue">2</format><format format_type="volume">35</format><format format_type="type">article</format><format format_type="extent">str. 85-91</format><identifier identifier_type="ISSN">0352-9045</identifier><identifier identifier_type="COBISSID">19325223</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-6RMO986Z</identifier><language>eng</language><publisher>Strokovno društvo za mikroelektroniko, elektronske sestavne dele in materiale</publisher><source>Informacije MIDEM</source><rights>InC</rights><subject language_type_id="slv">kisikova plazma</subject><title>Weakly ionized oxygen plasma</title></Record>