<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:doc-4MP70BED</identifier><date>1997</date><creator>Resnik, Drago</creator><relation>documents/znanstveni_clanki/vakuumist/html/URN_NBN_SI_doc-4MP70BED.html</relation><relation>documents/znanstveni_clanki/vakuumist/pdf/URN_NBN_SI_doc-4MP70BED.pdf</relation><relation>documents/znanstveni_clanki/vakuumist/txt/URN_NBN_SI_doc-4MP70BED.txt</relation><format format_type="volume">17</format><format format_type="issue">4</format><format format_type="main">4 strani</format><format format_type="type">article</format><format format_type="extent">str. 4-7</format><identifier identifier_type="ISSN">0351-9716</identifier><identifier identifier_type="COBISSID">984148</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-4MP70BED</identifier><language>slv</language><publisher>Društvo za vakuumsko tehniko Slovenije</publisher><source>Vakuumist</source><rights>InC</rights><subject language_type_id="slv">anizotropno jedkanje</subject><subject language_type_id="slv">elektronski elementi</subject><subject language_type_id="slv">mikroobdelava</subject><subject language_type_id="slv">površinska obdelava</subject><subject language_type_id="slv">silicij</subject><title>Mikroobdelava silicija</title></Record>