Effect of deposition time on nanocolumnar TiZrN films grown by reactive magnetron co-sputtering with the OAD technique

URN:NBN:SI:DOC-ZPB59L152021Chaiyakun, TeeranonChananonnawathorn, ChanunthornHorprathum, MatiLertvanithphol, TossapornPhae-ngam, WuttichaiSamransuksamer, Benjarongdocuments/doc/Z/URN_NBN_SI_doc-ZPB59L15_001.pdfdocuments/doc/Z/URN_NBN_SI_doc-ZPB59L15_001.txt55articleiss. 1str. 65-7010.17222/mit.2019.1891580-294953446147URN:NBN:SI:doc-ZPB59L15engInštitut za kovinske materiale in tehnologijeMateriali in tehnologijeInCOADreactive co-sputteringreaktivno istočasno naprševanjeself-annealing effectTiZrN filmučinek samo-popuščanja (samo-mehčanja)Effect of deposition time on nanocolumnar TiZrN films grown by reactive magnetron co-sputtering with the OAD techniqueVpliv časa nanašanja nanostebričastih TiZrN filmov z OAD tehniko in hkratnim reaktivnim magnetronskim naprševanjem