<Record><identifier xmlns="http://purl.org/dc/elements/1.1/">URN:NBN:SI:DOC-JG1ZYLFL</identifier><date>2003</date><creator>Rosenband, Valery</creator><creator>Torkar, Matjaž</creator><relation>documents/znanstveni_clanki/materiali_in_tehnologije/html/urn_nbn_si_doc-jg1zylfl.html</relation><relation>documents/znanstveni_clanki/materiali_in_tehnologije/pdf/urn_nbn_si_doc-jg1zylfl.pdf</relation><relation>documents/znanstveni_clanki/materiali_in_tehnologije/txt/urn_nbn_si_doc-jg1zylfl.txt</relation><format format_type="volume">37</format><format format_type="main">4 strani</format><format format_type="issue">6</format><format format_type="type">article</format><format format_type="extent">str. 365-368</format><identifier identifier_type="ISSN">1580-2949</identifier><identifier identifier_type="COBISSID">327338</identifier><identifier identifier_type="URN">URN:NBN:SI:doc-JG1ZYLFL</identifier><language>slv</language><publisher>Inštitut za kovinske materiale in tehnologije</publisher><source>Materiali in tehnologije</source><rights>InC</rights><subject language_type_id="slv">nitridi</subject><subject language_type_id="slv">rentgenska fotoelektronska spektroskopija</subject><subject language_type_id="slv">tanke plasti</subject><subject language_type_id="slv">trde plasti</subject><title>An XPS analysis of Ni3Al and TiAl3 ion nitrided in a pulsed plasma</title><title>XPS-analiza Ni3Al in TiAl3, ionsko nitriranega v pulzirajoči plazmi</title></Record>